Synchrotron radiation stimulated semiconductor processes: Chemical vapor deposition and etching
- 1 July 1989
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 60 (7) , 2157-2159
- https://doi.org/10.1063/1.1140807
Abstract
A synchrotron radiation beamline and reaction chamber were constructed for the study of synchrotron radiation excited photochemical reactions, especially for their application to semiconductor processes. Characteristics of this experiment and experimental results with chemical vapor deposition and etching in this beamline are described. The potential of this new application is discussed.Keywords
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