Extending Spatial-Phase-Locked Electron-Beam Lithography to Two Dimensions
- 1 December 1997
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 36 (12S)
- https://doi.org/10.1143/jjap.36.7557
Abstract
The global-fiducial grid mode of spatial-phase-locked electron-beam lithography in two dimensions is investigated. A phase-locking scheme for two-dimensions is proposed and analyzed. An expression for the minimum locking dose is derived. The use of a scintillating grid is proposed, and results from optical detection of a scintillating fiducial grating are reported.Keywords
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