Modelling of Temperature Distribution of Semiconductors During Rapid Thermal Processing
- 1 January 1994
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Defect‐Guarded Rapid Thermal ProcessingJournal of the Electrochemical Society, 1993
- New lamp arrangement for rapid thermal processingApplied Surface Science, 1993
- Optical and thermal modeling of a rapid thermal processorPublished by SPIE-Intl Soc Optical Eng ,1993
- Rta Implant Monitor: Does it Tell the Truth?MRS Proceedings, 1993
- Rapid Thermal Processor Modeling, Control, and Design for Temperature UniformityMRS Proceedings, 1993
- Three Dimensional Temperature Uniformity Modeling of a Rapid Thermal Processing ChamberMRS Proceedings, 1993
- Transient effects in rapid thermal processingIEEE Transactions on Semiconductor Manufacturing, 1992
- Is There a Way to a Perfect Rapid Thermal Processing System?MRS Proceedings, 1991
- Modelling of wafer heating during rapid thermal processingApplied Physics A, 1990