Development of a steady-state microwave ion source with large spherical electrodes for geometrical focusing
- 1 February 2000
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 71 (2) , 1144-1147
- https://doi.org/10.1063/1.1150410
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Microwave plasma source for the negative hydrogen ion productionReview of Scientific Instruments, 1998
- Microwave ion sources for material processing (invited)Review of Scientific Instruments, 1998
- Reduction of radiation-enhanced sublimation of graphite under high flux beam irradiationJournal of Nuclear Materials, 1996
- Flux dependence of sputtering yield for C and B4C by high flux neutral beamJournal of Nuclear Materials, 1995
- Analyses of Plasma Flux and Density Distribution in Plasma Sources Surrounded by Magnetic Multipole FieldsJapanese Journal of Applied Physics, 1995
- Performance characteristics of a microwave plasma source using an axial mirror and multipole magnetic fieldsReview of Scientific Instruments, 1992
- Electron cyclotron resonance plasma chemical vapor deposition of large area uniform silicon nitride filmsJournal of Vacuum Science & Technology A, 1991
- Effects of magnetic field and microwave power on electron cyclotron resonance-type plasma characteristicsJournal of Vacuum Science & Technology A, 1991
- Compact electron cyclotron resonance ion source with high density plasmaJournal of Vacuum Science & Technology A, 1991
- Microwave Plasma Source for Ion Sources with Multipolar and Axial Magnetic FieldsJapanese Journal of Applied Physics, 1990