Polishing of YBa2Cu3O7−y by He-ion etching
- 1 January 1992
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 71 (1) , 347-349
- https://doi.org/10.1063/1.350713
Abstract
Clean polishing is performed by helium‐ion etching on a surface of high‐Tc YBa2Cu3O7−y. Based on a knock‐on cascade model, the decrease of surface roughness is discussed. A rate process of etching is applied for the surface roughness of the high‐Tc YBa2Cu3O7−y.This publication has 13 references indexed in Scilit:
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