A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the Solid lithography simulator
- 1 September 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 14 (3-4) , 283-297
- https://doi.org/10.1016/0167-9317(91)90013-4
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Analysis for effects of mask defects to resist pattern using a three-dimensional photolithography simulatorJournal of Vacuum Science & Technology B, 1990
- Simulation of lithographic images and resist profilesMicroelectronic Engineering, 1990
- A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect EnvironmentIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1987
- Identifying And Monitoring Effects Of Lens Aberrations In Projection PrintingPublished by SPIE-Intl Soc Optical Eng ,1987
- Coherence of defect interactions with features in optical imagingJournal of Vacuum Science & Technology B, 1987
- Optical lithography simulation: Introduction to SPESAMicroelectronic Engineering, 1985
- PROLITH: A Comprehensive Optical Lithography ModelPublished by SPIE-Intl Soc Optical Eng ,1985
- A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithographyIEEE Transactions on Electron Devices, 1979
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975
- A Characterization of Ten Hidden-Surface AlgorithmsACM Computing Surveys, 1974