Photoresist characterization and linearization procedure for the gray-scale fabrication of diffractive optical elements
- 10 November 2001
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 40 (32) , 5921-5927
- https://doi.org/10.1364/ao.40.005921
Abstract
We present a procedure for the characterization and the linearization of the photoresist response to UV exposure for application to the gray-scale fabrication of diffractive optical elements. A simple and reliable model is presented as part of the characterization procedure. Application to the fabrication of surface-relief diffractive optical elements is presented, and theoretical predictions are shown to agree well with experiments.Keywords
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