Poly(2-trimethylsilyl-2-propyl methacrylate-co-γ-butyrolactone-2-yl methacrylate) for ArF lithography
- 1 August 1999
- Vol. 40 (18) , 5213-5217
- https://doi.org/10.1016/s0032-3861(99)00028-2
Abstract
No abstract availableKeywords
Funding Information
- Korea Advanced Institute of Science and Technology
- Seoul National University
- Ministry of Education (ISRC 97-E-1023)
- Korea Science and Engineering Foundation (97M3-0307-01-03-3)
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