ECR Plasma Deposition of Dielectrics for Optoelectronic Applications
- 1 January 1989
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Plasma characterization of an electron cyclotron resonance–radio-frequency hybrid plasma reactorJournal of Vacuum Science & Technology A, 1989
- X‐ray Photoelectron Spectroscopy Analysis of Changes in InP and InGaAs Surfaces Exposed to Various Plasma EnvironmentsJournal of the Electrochemical Society, 1988
- Magnetic field gradient effects on ion energy for electron cyclotron resonance microwave plasma streamJournal of Vacuum Science & Technology A, 1988
- Protective coating on the p-n junction of In0.53Ga0.47As/InP p-i-n planar diodes by vacuum-evaporated glassJournal of Applied Physics, 1987
- Material Processing with Broad-Beam Ion SourcesAnnual Review of Materials Science, 1983
- Hydrogen content of a variety of plasma-deposited silicon nitridesJournal of Applied Physics, 1982