New way for high-rate a-Si deposition
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 281-284
- https://doi.org/10.1016/0022-3093(87)90067-6
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Plasma-induced and plasma-assisted chemical vapour depositionThin Solid Films, 1985
- High-rate deposition of amorphous hydrogenated silicon from a SiH4 plasmaApplied Physics Letters, 1984