A novel positive resist for deep UV lithography
- 1 July 1989
- journal article
- Published by Wiley in Polymer Engineering & Science
- Vol. 29 (13) , 856-858
- https://doi.org/10.1002/pen.760291305
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resinsPublished by Elsevier ,2003
- An organosilicon photoresist for use in excimer laser lithographyMicroelectronic Engineering, 1987
- Recent Advances in Thermally and Photochemically Initiated Cationic PolymerizationPolymer Journal, 1985