Sputtering Yields for C60 and Au3 Bombardment of Water Ice as a Function of Incident Kinetic Energy
- 16 May 2007
- journal article
- research article
- Published by American Chemical Society (ACS) in Analytical Chemistry
- Vol. 79 (12) , 4493-4498
- https://doi.org/10.1021/ac070105l
Abstract
The total sputtering yields for water ice due to kiloelectronvolt cluster bombardment have been measured and compared to the predictions made by the mesoscale energy deposition footprint (MEDF) model. For C60 bombardment, the experimental yield varies almost linearly from 820 water molecule equivalents at an incident kinetic energy of 10 keV to 10 100 water molecule equivalents at a kinetic energy of 120 keV. For Au3 bombardment, the experimental yield varies almost linearly from 630 water molecule equivalents at an incident energy of 10 keV and rises to 1200 water molecule equivalents at 25 keV. The MEDF model is used to calculate relative yield trends with respect to incident energy using short-time molecular dynamics simulations. The results of these calculations indicate that the model can effectively predict the yield trends observed for these two clusters in experiments, although there is a consistent overestimate of the predicted induced C60 yield. It is hypothesized that this overestimate can be explained by the absence of reactions and ionization processes in the current simulations. Despite this omission, experimental yield trends can be accurately predicted using relatively small amounts of computer time. The success of the model in predicting the yield of water from ice films using a variety of energies and projectiles suggests this approach may greatly aid in the optimization of experimental configurations.Keywords
This publication has 20 references indexed in Scilit:
- Direct comparison of Au3+ and C60+ cluster projectiles in SIMS molecular depth profilingJournal of the American Society for Mass Spectrometry, 2007
- Effect of Cluster Size in Kiloelectronvolt Cluster Bombardment of Solid BenzeneAnalytical Chemistry, 2006
- Surface Sensitivity in Cluster-Ion-Induced SputteringPhysical Review Letters, 2006
- TOF-SIMS Analysis Using C60. Effect of Impact Energy on Yield and DamageAnalytical Chemistry, 2006
- Linearity and additivity in cluster-induced sputtering: A molecular-dynamics study of van der Waals bonded systemsPhysical Review B, 2004
- View from the edgeNature, 2003
- Fluid dynamics calculation of sputtering from a cylindrical thermal spikePhysical Review B, 2002
- Development of a triplasmatron ion source for the generation of SF5+ and F− primary ion beams on an ion microscope secondary ion mass spectrometry instrumentJournal of Vacuum Science & Technology A, 1999
- Secondary-ion yields from surfaces bombarded with keV molecular and cluster ionsPhysical Review Letters, 1989
- Comparison of polyatomic and atomic primary beams for secondary ion mass spectrometry of organicsAnalytical Chemistry, 1989