Development of a triplasmatron ion source for the generation of SF5+ and F− primary ion beams on an ion microscope secondary ion mass spectrometry instrument
- 1 May 1999
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 17 (3) , 845-852
- https://doi.org/10.1116/1.581657
Abstract
A hot filament duoplasmatron ion source operating with argon has been modified by the addition of an enclosed expansion cup mounted to the extraction side of the duoplasmatron anode. Using sulfur hexafluoride (SF6) as a feed gas, this triplasmatron ion source has been used to generate SF5+ and F− primary ion beams for secondary ion mass spectrometry (SIMS). For positive primary ions, the current extracted from the source is composed of a series of SFx+ cluster ions (x=1–5) with the SF5+ ion being the most intense. SF5+ currents of ∼ 10–20 nA with a maximum of 40 nA are obtained at an extraction voltage of 10 kV. By applying a positive bias to the expansion cup, a localized secondary arc discharge is initiated giving 200 nA–300 nA of SF5+ with a current density of 0.5 mA/cm2. Depending on the operating parameters of the source, lifetimes of greater than 70 h have been achieved. For negative primary ions (with the cup removed), the current extracted from the source is primarily composed of F− ions with a maximum current of 3 μA. The source can be briefly dosed with SF6 and will generate F- beams for 1–2 days without any additional gas being added. Evaluation of the SF5+ and F− ion beams for common SIMS applications demonstrates that these novel primary beams offer significant advantages for depth profiling, organic surface characterization and imaging.Keywords
This publication has 7 references indexed in Scilit:
- Preliminary evaluation of an SF5+ polyatomic primary ion beam for analysis of organic thin films by secondary ion mass spectrometryRapid Communications in Mass Spectrometry, 1998
- Evidence for strongly enhanced yields of negative molecular secondary ions due to bombardment with SFn cluster ionsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1994
- Comparison of polyatomic and atomic primary beams for secondary ion mass spectrometry of organicsAnalytical Chemistry, 1989
- Secondary ion emission and sputter yields from metal targets under fluorine ion (F2+) bombardmentAnalytical Chemistry, 1988
- Application of a trifluorocarbon ion (CF3+) primary ion source for depth profiling in secondary-ion mass spectrometryAnalytical Chemistry, 1988
- Triplasmatron sources for broad and reactive ion beamsVacuum, 1986
- A new way of producing ion beams from metals and gases using the plasma jet from a duoplasmatronNuclear Instruments and Methods, 1969