Triplasmatron sources for broad and reactive ion beams
- 1 November 1986
- Vol. 36 (11-12) , 851-855
- https://doi.org/10.1016/0042-207x(86)90125-9
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Electrostatic reflex plasma source as a plasma bridge neutralizerVacuum, 1986
- Rf multipolar plasma for broad and reactive ion beamsVacuum, 1986
- The performance of a microwave ion source immersed in a multicusp static magnetic fieldJournal of Vacuum Science & Technology B, 1986
- Plasma etching in a multipolar dischargeJournal of Applied Physics, 1985
- Plasma etching in magnetic multipole microwave dischargeApplied Physics Letters, 1984
- Interface states induced in silicon by tungsten as a result of reactive ion beam etchingJournal of Applied Physics, 1983
- Chemically assisted ion beam etching of GaAs, Ti, and MoJournal of Vacuum Science & Technology A, 1983
- Selective Reactive Ion Beam Etching of SiO2 over Polycrystalline SiJournal of the Electrochemical Society, 1982
- Theoretical and experimental study of the duoplasmatron ion source: Part I: Model of the duoplasmatron dischargeNuclear Instruments and Methods, 1974