Plasma etching in magnetic multipole microwave discharge
- 15 July 1984
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 45 (2) , 132-134
- https://doi.org/10.1063/1.95143
Abstract
A plasma etching reactor is described which associates surface magnetic confinement, microwave discharge, and independently controlled substrate biasing. Preliminary measurements show that the reactor produces reactive plasmas allowing anisotropic fine line etching at low ion energy.Keywords
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