Oxidation of GaAs in an oxygen multipole plasma
- 1 February 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 65 (3) , 315-330
- https://doi.org/10.1016/0040-6090(80)90242-4
Abstract
No abstract availableThis publication has 26 references indexed in Scilit:
- Plasma anodization of GaAs in a dc dischargeJournal of Vacuum Science and Technology, 1978
- GaAs microwave MOSFET'sIEEE Transactions on Electron Devices, 1978
- A new method of fabricating gallium arsenide MOS devicesApplied Physics Letters, 1978
- dc plasma anodization of GaAsApplied Physics Letters, 1978
- Low-temperature plasma oxidation of GaAsApplied Physics Letters, 1978
- Multipurpose plasma reactor for materials research and processingJournal of Vacuum Science and Technology, 1977
- Plasma oxidation of GaAsApplied Physics Letters, 1976
- MOS-gate technology on GaAs and other III–V compoundsJournal of Vacuum Science and Technology, 1976
- The Anodization of GaAs and GaP in Aqueous SolutionsJournal of the Electrochemical Society, 1976
- Oxide Films Grown on GaAs in an Oxygen PlasmaJournal of Applied Physics, 1966