Fabrication techniques for grating-based optical devices
- 1 November 1999
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 17 (6) , 3208-3211
- https://doi.org/10.1116/1.590981
Abstract
We describe a novel, versatile process for fabricating integrated Bragg-grating devices. Our process addresses many of the critical challenges presented by such devices, including period selection, alignment, spatial coherence, and nanolithography. Using a combination of e-beam, x-ray, optical, and interference lithographies, we have successfully employed this process to construct 244 nm period, quarter-wave-shifted Bragg gratings on top of 1- m-tall waveguide structures in InP.
Keywords
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