A doubly preionised ArF laser
- 1 September 1984
- journal article
- Published by IOP Publishing in Journal of Physics E: Scientific Instruments
- Vol. 17 (9) , 760-764
- https://doi.org/10.1088/0022-3735/17/9/011
Abstract
A doubly preionised ArF excimer laser is described using a pulse forming network (PFN) with an LC-inversion circuit totally enclosed inside the laser volume. The high potential difference across the capacitors uniformly preionises the laser gas and arcing is prevented by carefully shaping the metal surfaces inside the laser. By applying normal preionisation techniques the main discharge runs in a stable mode. The output energy of the laser from a volume of 65 cm3 was 50 mJ at a charging voltage of 25 kV and the performance of the laser with the pre-ionisation technique is compared with the performance of two other excimer lasers without the use of this technique. A circuit model indicates that good preionisation results in better impedance matching between the PFN and the laser plasma.Keywords
This publication has 8 references indexed in Scilit:
- Preionization kinetics of an X-ray preionized XeCl gas discharge laserApplied Physics B Laser and Optics, 1983
- A simple tunable KrF laser system with narrow bandwidth and diffraction-limited divergenceJournal of Physics D: Applied Physics, 1982
- Necessary conditions for the homogeneous formation of pulsed avalanche discharges at high gas pressuresJournal of Applied Physics, 1980
- Theoretical studies of UV-preionized transverse discharge KrF and ArF lasersIEEE Journal of Quantum Electronics, 1978
- 1/4-J discharge pumped KrF laserReview of Scientific Instruments, 1978
- Modeling the KrF laser dischargeApplied Physics Letters, 1976
- Investigations of glow discharge formation with volume preionizationJournal of Applied Physics, 1975
- Calculations of discharge initiation in overvolted parallel-plane gapsJournal of Applied Physics, 1974