The adsorption and reaction of fluorine on the Si(100) surface
- 1 May 1989
- journal article
- review article
- Published by Elsevier in Surface Science
- Vol. 215 (3) , 437-500
- https://doi.org/10.1016/0039-6028(89)90271-9
Abstract
No abstract availableThis publication has 66 references indexed in Scilit:
- Synchrotron photoemission investigation: Fluorine on silicon surfacesApplied Physics Letters, 1984
- Synchrotron photoemission investigation of the initial stages of fluorine attack on Si surfaces: Relative abundance of fluorosilyl speciesPhysical Review B, 1984
- Comparison of XeF2 and F-atom reactions with Si and SiO2Applied Physics Letters, 1984
- The reaction probability of XeF2 with siliconJournal of Applied Physics, 1983
- Plasma-Assisted Etching in MicrofabricationAnnual Review of Materials Science, 1983
- Gaseous products from the reaction of XeF2 with siliconJournal of Applied Physics, 1983
- The design of plasma etchantsPlasma Chemistry and Plasma Processing, 1981
- Chemical sputtering of fluorinated siliconPhysical Review B, 1981
- Electron spectroscopy study of silicon surfaces exposed to XeF2 and the chemisorption of SiF4 on siliconJournal of Applied Physics, 1980
- The etching of silicon with XeF2 vaporApplied Physics Letters, 1979