Optical Properties of Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
- 1 August 1985
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 24 (8A) , L605-607
- https://doi.org/10.1143/jjap.24.l605
Abstract
The detailed study of optical transmittance and reflectance in Al-doped ZnO thin films prepared by rf magnetron sputtering is described. Films obtained with Al2O3 content up to 10 wt% showed an average transmittance above 85% in the visible range. The absorption edge was blue-shifted with increasing carrier concentration. The shift was interpreted to be a result of competition between many body effects and the Burstein-Moss effect. It is shown that films obtained with an Al2O3 content of 1–2 wt% can achieve an excellent IR shielding.Keywords
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