Transparent and Highly Conductive Films of ZnO Prepared by RF Sputtering
- 1 April 1983
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 22 (4A) , L245
- https://doi.org/10.1143/jjap.22.l245
Abstract
Zinc oxide thin films with the resistivity of 5×10-3Ω·cm and the transparency of above 80% at the wavelength between 400 and 800 nm have been prepared by conventional rf sputtering in pure argon from a zinc oxide target. A close relation of their electrical characteristics with crystallographic characteristics is found using X-ray diffraction analysis. The low resistivity films consist of very small crystal grains, the c-axis of which is not preferentially oriented or is weakly oriented parallel to the substrate surface.Keywords
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