Silicone polymer deposition by CO2 laser induced decomposition of silane in the presence of methyl methacrylate
- 1 August 1988
- journal article
- research article
- Published by Springer Nature in Applied Physics A
- Vol. 46 (4) , 275-279
- https://doi.org/10.1007/bf01210346
Abstract
No abstract availableKeywords
This publication has 34 references indexed in Scilit:
- Relative rate studies for silyleneChemical Physics Letters, 1986
- Intramolecular Interaction in The Chemical Behavior of Carbon-Functional Organosilicon CompoundsPublished by Springer Nature ,1984
- Chemical Vapor Deposition of Silicon Films by Pulsed CO2 Laser Irradiaton of SilaneMRS Proceedings, 1983
- Infrared multiphoton decomposition of monosilaneJournal of the American Chemical Society, 1981
- A comparative study of the SF6-sensitized interaction of a cw-CO2 laser radiation with methyltrichloro derivatives of carbon, silicon and germaniumCollection of Czechoslovak Chemical Communications, 1981
- Studies of the mechanism of the decomposition of hydrogenated a-Si filmsPhilosophical Magazine Part B, 1980
- Mechanism of the thermal decomposition of monosilaneThe Journal of Physical Chemistry, 1980
- Infrared laser photochemistry of silaneThe Journal of Chemical Physics, 1979
- Silylene additions to cyclopentadiene and 1,3-cyclohexadiene. Evidence for the addition mechanismJournal of Organometallic Chemistry, 1975
- The pyrolysis of monosilaneProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1966