Quantitative Aspects of the Tunneling Resistance in n-GaAs Schottky Barriers
- 1 December 1971
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 42 (13) , 5689-5698
- https://doi.org/10.1063/1.1660000
Abstract
The influence of the doping level and the barrier height on the characteristics of the differential resistance of M/n‐GaAs tunnel contacts has been investigated both theoretically and experimentally. The computation has been based on a pure WKBJ approximation and the quadrature over the momentum parallel to the interface was included. The position of the resistance maximum appears strongly dependent on the barrier height and insensitive to the value of the doping level. Vacuum‐cleaved contacts have been made with various metals, i.e., barrier heights, for two different values of the carrier density. In spite of some systematic absolute discrepancies, the experimental variations of the differential resistance with the barrier parameters are in good agreement with theory.This publication has 15 references indexed in Scilit:
- Band-Structure Effects in Metal-GaSb Tunnel Contacts Under PressurePhysical Review Letters, 1971
- Tunneling in Pb/n-GaAs junctions under hydrostatic pressureSolid State Communications, 1971
- Phonon and Plasmon Interactions in Metal-Semiconductor Tunneling JunctionsPhysical Review B, 1970
- Phonon structures in metal-semiconductor tunnel junctionsSolid State Communications, 1970
- Tunneling Measurement of Electron-Plasmon Interaction in Degenerate SemiconductorsPhysical Review B, 1969
- Observations of Surface Plasmon Excitation by Tunneling Electrons in GaAs-Pb Tunnel JunctionsPhysical Review Letters, 1969
- Schottky Barriers on GaAsPhysical Review B, 1969
- Electron-Phonon Coupling in the Barriers of GaAs Schottky DiodesPhysical Review B, 1968
- Tunneling Spectroscopy in GaAsPhysical Review B, 1967
- Differential resistance peaks of Schottky barrier diodesSolid-State Electronics, 1967