Subbands and charge control in a two-dimensional electron gas field-effect transistor
- 1 February 1984
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 44 (3) , 307-309
- https://doi.org/10.1063/1.94734
Abstract
A calculation of the subband structure and charge distribution in an AlxGa1−xAs/GaAs heterojunction as a function of gate voltage at room temperature has been performed. The results show that usually about 80% of the electrons in the channel are in the lowest two subbands and describe for the first time quantitatively the transition from the simple capacitive charge control regime to the regime where the channel density is no longer controlled by the gate voltage.Keywords
This publication has 7 references indexed in Scilit:
- Characteristics of modulation-doped AlxGa1−xAl/GaAs field-effect transistors: Effect of donor-electron separationApplied Physics Letters, 1983
- Electrical Properties of Si-Doped AlxGa1-xAs Layers Grown by MBEJapanese Journal of Applied Physics, 1982
- Model for modulation doped field effect transistorIEEE Electron Device Letters, 1982
- Modulation-doped (Al,Ga)As/GaAs FETs with high transconductance and electron velocityElectronics Letters, 1982
- Metal-(n) AlGaAs-GaAs two-dimensional electron gas FETIEEE Transactions on Electron Devices, 1982
- Electronic properties of two-dimensional systemsReviews of Modern Physics, 1982
- The present status of modulation-doped and insulated-gate field-effect transistors in III–V semiconductorsSurface Science, 1982