Quasidiffusion and the localized phonon source in photoexcited Si
- 31 May 1993
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 70 (22) , 3463-3466
- https://doi.org/10.1103/physrevlett.70.3463
Abstract
Previous observations of heat pulses produced by localized photoexcitation of silicon do not support the predictions of phonon ‘‘quasidiffusion’’ via anharmonic decay and elastic scattering. Our experiments, with controlled boundary conditions, verify that quasidiffusive theory is relevant in Si under very weak photoexcitation. Beyond this domain a transition to a localized source of low frequency phonons is attributed to excited carrier interactions. Photoluminescence experiments confirm the presence of electron-hole droplets coincident with this localized phonon source.Keywords
This publication has 10 references indexed in Scilit:
- Propagation of optically generated acoustic phonons in SiPhysical Review B, 1993
- Phonon propagation with isotope scattering and spontaneous anharmonic decayPhysical Review B, 1990
- Measurement of a phonon hot spot in photoexcited SiZeitschrift für Physik B Condensed Matter, 1989
- The temperature and energy distribution of photoexcited hot electronsAdvances in Physics, 1987
- Spontaneous decay rates of LA phonons in quasi-isotropic solidsPhysical Review B, 1985
- Isotope scattering of dispersive phonons in GePhysical Review B, 1983
- Propagation of laser-generated heat pulses in crystals at low temperature: Spatial filtering of ballistic phononsPhysical Review B, 1982
- Electron-hole droplet transport up to near-sonic velocity in SiPhysical Review B, 1982
- Properties of the electron-hole liquid in Si: Zero stress to the high-stress limitPhysical Review B, 1981
- Phonon diffusion with frequency down‐conversionPhysica Status Solidi (b), 1979