XPS characterization of chromium films deposited from Cr(CO)6 at 248 nm
- 1 December 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 43 (1-4) , 11-16
- https://doi.org/10.1016/0169-4332(89)90183-9
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- Laser-induced chemical vapor deposition of chromium films from chromiumhexacarbonyl using a KrF excimer laserApplied Surface Science, 1989
- Growth kinetics of nickel microstructures produced by laser-induced decomposition of nickel tetracarbonylJournal of Applied Physics, 1988
- Film growth and mechanism of LICVD of chromium films from Cr(CO)6 at 248 nmApplied Physics A, 1988
- Origin of contaminants in photochemically deposited chromium filmsApplied Physics Letters, 1988
- Laser-assisted deposition of iron on Si(111)-(7×7): The mechanism and energetics of Fe(CO)5 decompositionThe Journal of Chemical Physics, 1987
- Mechanisms of laser interaction with metal carbonyls adsorbed on Si(111)7×7: Thermal vs photoelectronic effectsThe Journal of Chemical Physics, 1987
- Mechanisms of carbon and oxygen incorporation into thin metal films grown by laser photolysis of carbonylsJournal of Applied Physics, 1987
- Laser chemical vapor deposition of patterned Fe on silica glass: Observation and origins of periodic ripple structuresJournal of Applied Physics, 1986
- Photothermal effect contribution on film quality improvement in excimer-laser induced metal CVDApplied Physics A, 1985
- Laser photodeposition of refractory metalsApplied Physics Letters, 1981