Infrared spectra and characterization of the products of fluorine atom reactions with matrix isolated NO molecules

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Abstract
Simultaneous matrix deposition of F2 and NO molecules at high dilution in argon and nitrogen onto an 8°K CsI window produces three new infrared absorptions in addition to those of normal, FN‐bonded nitrosyl fluoride, FNO. The infrared features at 1886.6, 734.9, and 492.2 cm−1 (Ar matrix) and their 15N and 18O isotopic counterparts were assigned to the previously unobserved FO‐bonded isomer NOF, which appears to be a bent molecule having a molecular geometry similar to that of nitrosyl fluoride. Controlled fluorine atom diffusion at 20°K, in the absence of photolytic radiation, results in increased yields of the NOF molecule, while matrix photolysis experiments at 8°K have established that this species undergoes intramolecular photorearrangement to the more stable FNO form when exposed to radiation comprised of wavelengths below 280 nm.

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