The electroformed metal-insulator-metal structure: a comprehensive model
- 3 April 2002
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 35 (8) , 802-809
- https://doi.org/10.1088/0022-3727/35/8/312
Abstract
A new model is presented of the electroformed metal-insulator-metal structure which explains its various properties including electron emission, electroluminescence, memory effects and, for the first time, a complete account of the differential negative resistance. The model is based upon experiments which identify the conduction process to be trap-controlled thermally activated tunnelling between metal islands produced in the forming process. The implications for the production of commercial electroformed devices are discussed.Keywords
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