Comparison of the properties of BN films synthesized by inductively coupled r.f. and microwave plasmas
- 1 December 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 270 (1-2) , 118-123
- https://doi.org/10.1016/0040-6090(95)06909-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Preparation of cubic boron nitride films by low pressure inductively coupled plasma enhanced chemical vapor depositionApplied Physics Letters, 1994
- Effects of the substrate bias on the formation of cubic boron nitride by inductively coupled plasma enhanced chemical vapor depositionJournal of Applied Physics, 1994
- A simple model for the formation of compressive stress in thin films by ion bombardmentThin Solid Films, 1993
- Cubic boron nitride: synthesis, physicochemical properties and applicationsMaterials Science and Engineering: B, 1991
- Properties of tetrahedral amorphous carbon prepared by vacuum arc depositionDiamond and Related Materials, 1991