Photorefractive lithography with synchrotron light in poly(methyl methacrylate)
- 11 August 2003
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 83 (6) , 1116-1118
- https://doi.org/10.1063/1.1600507
Abstract
Synchrotron light changes the refractive index of poly(methyl methacrylate) (PMMA). Refractive-index enhancements as well as reductions depending on dose and energy of the radiation used can be observed. This effect allows the manufacturing of, for example integrated-optical components, as is demonstrated by realization of waveguides in PMMA.Keywords
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