Au/H:Si(111)(1×1)interface versusAu/Si(111)(7×7)

Abstract
The room-temperature growth of gold on Si(111) surfaces has been directly compared for nonreconstructed hydrogen-terminated surfaces and the bare 7×7-reconstructed surface by means of high-resolution core-level and valence-band photoelectron spectroscopy and Auger spectroscopy. The growth modes show strong differences with gold island formation on the passivated H:Si(111)(1×1) surface. Silicon segregated on top of the deposited gold film is seen for both interfaces. The Schottky barrier is only weakly affected by the hydrogen termination.