Low-fluence excimer laser irradiation-induced defect formation in indium-tin oxide films
- 1 April 1996
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 96-98, 363-369
- https://doi.org/10.1016/0169-4332(95)00527-7
Abstract
No abstract availableThis publication has 28 references indexed in Scilit:
- ESCA investigation of SnOx films used as gas sensorsSurface and Interface Analysis, 1994
- Maskless patterning of indium tin oxide layer for flat panel displays by diode-pumped Nd:YLF laser irradiationApplied Physics Letters, 1994
- Microstructure and etching properties of sputtered indium—tin oxide (ITO)Physica Status Solidi (a), 1991
- Plasma Etching of ITO Thin Films Using a CH4/H2 Gas MixtureJapanese Journal of Applied Physics, 1990
- Heat treatment in hydrogen gas and plasma for transparent conducting oxide films such as ZnO, SnO2 and indium tin oxideThin Solid Films, 1989
- Optical dispersion in electron-beam-evaporated indium tin oxide thin filmsThin Solid Films, 1989
- Preparation and physical properties of transparent conducting oxide filmsPhysica Status Solidi (a), 1982
- Thin metallic oxides as transparent conductorsThin Solid Films, 1982
- X-ray and optical measurements in the In2O3-SnO2 systemPhysica Status Solidi (a), 1979
- Relative differential subshell photoionisation cross-sections (MgKα) from lithium to uraniumJournal of Electron Spectroscopy and Related Phenomena, 1978