Effet de la température sur les propriétés optiques de couches minces de silicum amorphe préparées par décomposition en phase vapeur
- 1 April 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 78 (3) , 235-243
- https://doi.org/10.1016/0040-6090(89)90589-0
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Retarding crystallization of CVD amorphous silicon by alloyingJournal of Non-Crystalline Solids, 1980
- The effects of surface characteristics on the visible and uv optical properties of CVD amorphous silicon filmsSolar Energy Materials, 1979
- Stabilized CVD amorphous silicon for high temperature photothermal solar energy conversionSolar Energy Materials, 1979
- Temperature variation of the absorption edge of CVD amorphous and polycrystalline siliconSolar Energy Materials, 1979
- Optical properties and structure of amorphous silicon films prepared by CVDSolar Energy Materials, 1979
- Chemical vapor deposition of thin semiconductor films for solar energy conversionThin Solid Films, 1976
- Temperature dependence of the energy gap in semiconductorsPhysica, 1967
- Temperature Dependence of the Energy Gap in SemiconductorsPhysical Review B, 1951
- Deformation Potentials and Mobilities in Non-Polar CrystalsPhysical Review B, 1950
- Temperature Dependence of the Energy Gap in Monatomic SemiconductorsPhysical Review B, 1950