Fabrication of an all-refractory circuit using lift-off with image-reversal photoresist
- 1 March 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 27 (2) , 3121-3124
- https://doi.org/10.1109/20.133872
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Fabrication of Nb/Al-Al/sub 2/O/sub 3//Nb junctions with extremely low leakage currentsIEEE Transactions on Magnetics, 1989
- NbN edge junction fabrication: edge profile control by reactive ion etchingIEEE Transactions on Magnetics, 1989
- Josephson shift register design and layoutIEEE Transactions on Magnetics, 1989
- A Practical Approach To Submicron LithographyPublished by SPIE-Intl Soc Optical Eng ,1987
- Optical single layer lift-off processIEEE Transactions on Electron Devices, 1985