Chemiluminescence during thermal chemical vapour deposition of SiO2 from silane-oxygen mixtures
- 2 December 1988
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 153 (1) , 33-38
- https://doi.org/10.1016/0009-2614(88)80128-3
Abstract
No abstract availableKeywords
This publication has 31 references indexed in Scilit:
- The kinetics of silicon dioxide chemical vapour deposition III: Experimental verification of the modelSurface and Coatings Technology, 1986
- Thermochemical and Spectroscopic Studies of Chemically Vapor‐Deposited Amorphous SilicaJournal of the Electrochemical Society, 1986
- The kinetics of silicon dioxide chemical vapour deposition II: The model of the processSurface Technology, 1985
- The kinetics of silicon dioxide chemical vapour deposition I: Surface chemical reactionsSurface Technology, 1985
- Belt Transport CVD ProcessingJournal of the Electrochemical Society, 1983
- A Theoretical Study of the Low‐Temperature Chemical Vapor Deposition of SiO2 FilmsJournal of the Electrochemical Society, 1983
- Deposition kinetics of SiO2 filmJournal of Applied Physics, 1981
- SiO2 Particulates Dispersed in a CVD Reactor: II . Correlation with Film CharacteristicsJournal of the Electrochemical Society, 1980
- SiO2 Particulates Dispersed in CVD Reactor: I . Semi‐In Situ ObservationJournal of the Electrochemical Society, 1977
- Growth of silica and phosphosilicate filmsJournal of Applied Physics, 1973