Nanoscale silicon structures by using carbon nanotubes as reactive ion etch masks
- 5 April 2005
- journal article
- Published by IOP Publishing in Nanotechnology
- Vol. 16 (6) , 750-753
- https://doi.org/10.1088/0957-4484/16/6/021
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- Towards pick-and-place assembly of nanostructures.Journal of Nanoscience and Nanotechnology, 2004
- Suspended Multiwalled Carbon Nanotubes as Self-aligned Evaporation MasksJournal of Nanoscience and Nanotechnology, 2003
- Torsional Response and Stiffening of Individual Multiwalled Carbon NanotubesPhysical Review Letters, 2002
- Quantum dots in suspended single-wall carbon nanotubesApplied Physics Letters, 2001
- Scanning microscopic four-point conductivity probesSensors and Actuators A: Physical, 2001
- Uniform patterned growth of carbon nanotubes without surface carbonApplied Physics Letters, 2001
- Reversible electromechanical characteristics of carbon nanotubes underlocal-probe manipulationNature, 2000
- Predictions of Enhanced Chemical Reactivity at Regions of Local Conformational Strain on Carbon Nanotubes: Kinky ChemistryThe Journal of Physical Chemistry B, 1999
- Continuous production of aligned carbon nanotubes: a step closer to commercial realizationPublished by Elsevier ,1999
- Nanometre-scale rolling and sliding of carbon nanotubesNature, 1999