Substrate orientation dependence of self-limited atomic-layer etching of Si with chlorine adsorption and low-energy Ar+ irradiation
- 1 December 1994
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 82-83, 422-427
- https://doi.org/10.1016/0169-4332(94)90252-6
Abstract
No abstract availableFunding Information
- Sumitomo Foundation
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 5 references indexed in Scilit:
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