Photoresist-free fabrication process for a-Si:H thin film transistors
- 1 May 1998
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 227-230, 1217-1220
- https://doi.org/10.1016/s0022-3093(98)00308-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Via-Hole Addressed TFT and Process for Large-Area A-Si:H ElectronicsMRS Proceedings, 1997
- Electrophotographic patterning of thin-film silicon on glass foilIEEE Electron Device Letters, 1995
- A new patterning process concept for large-area transistor circuit fabrication without using an optical mask alignerIEEE Transactions on Electron Devices, 1994