Vapor Deposition of Metal Oxides and Silicates: Possible Gate Insulators for Future Microelectronics
- 10 July 2001
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 13 (8) , 2463-2464
- https://doi.org/10.1021/cm010145k
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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