Properties of [Mg2(thd)4] as a Precursor for Atomic Layer Deposition of MgO Thin Films and Crystal Structures of [Mg2(thd)4] and [Mg(thd)2(EtOH)2]
- 29 June 1999
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 11 (7) , 1846-1852
- https://doi.org/10.1021/cm991008e
Abstract
No abstract availableKeywords
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