The effect of pulse repetition rate on laser ablation of polyimide and polymethylmethacrylate-based polymers
- 14 May 1996
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 29 (5) , 1349-1355
- https://doi.org/10.1088/0022-3727/29/5/034
Abstract
No abstract availableKeywords
This publication has 67 references indexed in Scilit:
- Laser polymer ablation threshold lowered by nanometer hot spotsApplied Physics Letters, 1994
- Transient absorption spectroscopic study on photothermal process and laser ablation of poly(N-vinylcarbazole) filmThe Journal of Physical Chemistry, 1993
- Excimer laser ablation of novel triazene polymers: influence of structural parameters on the ablation characteristicsThe Journal of Physical Chemistry, 1993
- Laser ablation of doped polymers: transient phenomena as the ablation threshold is approachedMacromolecules, 1992
- Fluence-dependent transmission of polyimide at 248 nm under laser ablation conditionsApplied Physics Letters, 1991
- The significance of a fluence threshold for ultraviolet laser ablation and etching of polymersJournal of Applied Physics, 1990
- Theoretical study of ablative photodecomposition in polymeric solidsThe Journal of Physical Chemistry, 1989
- Influence of pulse width on ultraviolet laser ablation of poly(methyl methacrylate)Applied Physics Letters, 1988
- Excimer laser light induced ablation and reactions at polymer surfaces as measured with a quartz-crystal microbalanceJournal of Applied Physics, 1988
- Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laserApplied Physics Letters, 1982