High-Resolution Replicas and Their Application
- 1 June 1954
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 25 (6) , 712-719
- https://doi.org/10.1063/1.1721721
Abstract
Using methyl methacrylate as an intermediate, an attempt was made to obtain a high-resolution two-step replica, by improving evaporation elements and evaporation method. It was found that, by using Zr, Si, and Fe, with Ge and Cr as evaporation elements, the resolution of two-step replicas was superior to that obtained up to the present. It is also known that the resolution of replicas obtained by performing metallic evaporation after treatment by ion or electron bombardment for a methyl methacrylate intermediate replica is superior to that without bombardment. Two evaporation methods—the usual continuous method and an intermittent one—were compared. A new method for the production of surface replicas of microspecimens is also proposed. The high-resolution replica obtained here is compared with others along with a brief consideration of the results obtained.This publication has 9 references indexed in Scilit:
- Methods in Electron Microscopy of SolidsReview of Scientific Instruments, 1952
- On the Metallic Shadow-Casting Using a Nozzle SystemJournal of Applied Physics, 1952
- Inorganic Replication in Electron MicroscopyBell System Technical Journal, 1951
- A Positive-Replica Technique for Electron MicroscopyJournal of Applied Physics, 1949
- A Methyl Methacrylate–Silica Replica Technique for Electron MicroscopyNature, 1947
- Preparation and Uses of Silica Replicas in Electron MicroscopyJournal of Applied Physics, 1947
- Applications of Metallic Shadow-Casting to MicroscopyJournal of Applied Physics, 1946
- Electron Microscopical Replica Techniques for the Study of Organic SurfacesJournal of Applied Physics, 1945
- Fine Structure of Metallic Surfaces with the Electron MicroscopeJournal of Applied Physics, 1943