Application of Plasma Polymerized Methylsilane in an all dry resist process for 193 and 248 nm Lithography
- 31 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4) , 275-278
- https://doi.org/10.1016/0167-9317(95)00244-8
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Plasma polymerized all-dry resist process for 0.25 μm photolithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994