Growth, Structure and Stress of DC Magnetron Sputtered TiB2 Thin Films
- 1 January 1994
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Stress-related effects in thin filmsThin Solid Films, 1989
- Determination of film stresses during sputter deposition using an i n s i t u probeJournal of Vacuum Science & Technology A, 1985
- TiB2-coated cathodes for aluminum smelting cellsThin Solid Films, 1984
- Thick boride coatings by chemical vapor depositionThin Solid Films, 1982
- Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron sourceJournal of Vacuum Science and Technology, 1982
- Mechanical properties of chemical vapor deposited coatings for fusion reactor applicationJournal of Vacuum Science and Technology, 1981
- Plasma-sprayed coatings for fusion reactor applicationsThin Solid Films, 1979
- Coatings for fusion reactor environmentsThin Solid Films, 1979
- Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputteringJournal of Vacuum Science and Technology, 1977
- Aluminum films deposited by rf sputteringMetallurgical Transactions, 1970