Step coverage simulation and measurement in a dc planar magnetron sputtering system
- 1 June 1983
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 54 (6) , 3489-3496
- https://doi.org/10.1063/1.332414
Abstract
The step coverage of a dc planar magnetron sputtering system with a revolving substrate is analyzed by both computer simulation and measurement of the step coverage. The model assumes line of sight deposition, no reemission, and the cosine growth law. Good quantitative agreement has been obtained between the model and the experiments. The modeled system does not show the deep cracks typical of the point source planetary system. This is explained by comparing the vapor distribution functions of the planetary and the sputtering systems.This publication has 4 references indexed in Scilit:
- Angular distribution of sputtered atoms from polycrystalline metal targetsJournal of Applied Physics, 1981
- Simulation of ion-beam etched pattern profilesJournal of Vacuum Science and Technology, 1981
- Optimization of Al step coverage through computer simulation and scanning electron microscopyJournal of Vacuum Science and Technology, 1978
- A sputtering technique for coating the inside walls of through-holes in substratesJournal of Vacuum Science and Technology, 1974