Carrier-gas effects on characteristics of copper chemical vapor deposition using hexafluoro-acetylacetonate-copper (1) trimethylvinylsilane
- 1 June 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 262 (1-2) , 12-19
- https://doi.org/10.1016/0040-6090(95)05815-x
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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