Metal—organic chemical vapor deposition of copper using hydrated copper formate as a new precursor
- 1 June 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 262 (1-2) , 1-6
- https://doi.org/10.1016/0040-6090(95)05813-3
Abstract
No abstract availableThis publication has 25 references indexed in Scilit:
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