Preparation of Ferroelectric PbTiO3 Thin Film by Reactive Sputtering
- 1 April 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (4R)
- https://doi.org/10.1143/jjap.30.727
Abstract
Ferroelectric PbTiO3 thin films have been successfully obtained. The films were fabricated by reactive sputtering using a simple metal composite as a target. Without postannealing, the films with perovskite structure have been obtained at substrate temperatures of 600-620°C. The spontaneous polarization (P s) and the coercive field (E c) of a 0.70 µm-thick film were measured as 37 µC/cm2 and 86 kV/cm, respectively.Keywords
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