Thermodynamic evaluation of chemically vapour- deposited Si3N4 films prepared by nitradation of dichlorosilane
- 26 February 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 88 (4) , 339-346
- https://doi.org/10.1016/0040-6090(82)90172-9
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Chemical Processes in Vapor Deposition of Silicon: I . Deposition from and Etching byJournal of the Electrochemical Society, 1975
- A New Method for the Epitaxial Growth of Silicon and Its Thermodynamical AnalysisJapanese Journal of Applied Physics, 1969
- Thermodynamical Analyses and Experiments for the Preparation of Silicon NitrideJapanese Journal of Applied Physics, 1968
- Analysis of the Hydrogen Reduction of Silicon Tetrachloride Process on the Basis of a Quasi-Equilibrium ModelJournal of the Electrochemical Society, 1964