The growth characteristics of ion-beam sputtered CoCr films on Ta isolation layers
- 1 September 1984
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 20 (5) , 776-778
- https://doi.org/10.1109/tmag.1984.1063377
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Magneto-Optic Kerr Effect in RF Sputtered Co–Cr Film with Perpendicular AnisotropyJapanese Journal of Applied Physics, 1982
- An analysis for the magnetization mode for high density magnetic recordingIEEE Transactions on Magnetics, 1977
- Electron microscopy on high-coercive-force Co-Cr composite filmsIEEE Transactions on Magnetics, 1970
- A NEW STRUCTURE IN TANTALUM THIN FILMSApplied Physics Letters, 1965